Mohlo by sa vám tiež páčiť

Viac informácií o knihe Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

• Parametre knihy
• Anotácia kniha
• Obľúbené z iného súdka

Nákupom získate 304 bodov

Anotácia knihy

An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes.§A handbook for engineers and scientists and an introduction for students of microelectronics.

Parametre knihy

Zaradenie knihy Books in English Mathematics & science Physics Materials / States of matter

• Celý názov: Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies
• Autor: Y. Pauleau
• Jazyk: Angličtina
• Väzba: Brožovaná
• Počet strán: 363
• EAN: 9781402005251
• ISBN: 1402005253
• ID: 01414744
• Nakladateľ: Springer-Verlag New York Inc.
• Hmotnosť: 1190 g
• Rozmery: 240 × 160 × 21 mm
• Dátum vydania: 30. April 2002

Obľúbené z iného súdka

---

---

---