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Book synopsis

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various communities to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigationIncludes information on processing and metrology techniquesBrings together multiple approaches to litho pattern recording from academia and industry in one place

Book details

Book category Books in English Technology, engineering, agriculture Technology: general issues Nanotechnology

• Full title: Materials and Processes for Next Generation Lithography
• Author: Alex Robinson
• Language: English
• Binding: Hardback
• Number of pages: 634
• EAN: 9780081003541
• ISBN: 0081003544
• ID: 10000207
• Publisher: Elsevier Health Sciences
• Weight: 1450 g
• Dimensions: 229 × 152 × 35 mm
• Date of publishing: 18. November 2016

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