Code: 04949772

Atomic Layer Deposition

Name: Atomic Layer Deposition
Brand: John Wiley & Sons Inc
SKU: 04949772
Price: 205.54 EUR
Availability: InStock
Author: Tommi Kaariainen
ISBN: 9781118062777

by Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman

Language: English
Binding: Hardback
Number of pages: 272
Publisher: John Wiley & Sons Inc, 2013
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Book synopsis

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Book details

Book category Books in English Technology, engineering, agriculture Electronics & communications engineering Electronics engineering

205.54 €

Full title: Atomic Layer Deposition
Subtitle: Principles, Characteristics, and Nanotechnology Applications
Author: Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman
Language: English
Binding: Hardback
Number of pages: 272
EAN: 9781118062777
ISBN: 1118062779
ID: 04949772
Publisher: John Wiley & Sons Inc
Weight: 582 g
Dimensions: 164 × 240 × 25 mm
Date of publishing: 28. June 2013