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More about CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155

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Book synopsis

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

Book details

Book category Books in English Technology, engineering, agriculture Mechanical engineering & materials Materials science

• Full title: CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
• Author: Alexander A. DemkovBill TaylorH. Rusty HarrisJeffery W. Butterbaugh
• Language: English
• Binding: Hardback
• Number of pages: 194
• EAN: 9781605111285
• ISBN: 1605111287
• ID: 02060485
• Publisher: Materials Research Society
• Weight: 430 g
• Dimensions: 236 × 160 × 14 mm
• Date of publishing: 19. November 2009

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