Code: 06329333
EUV Sources for Lithography
by Vivek Bakshi
An authoritative reference book on EUV source technology. Topics range from an overview of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and las ... more
- Language:
English - Binding: Hardback
- Number of pages: 900
Publisher: SPIE Press, 2005
- More about this
189.64 €
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Book synopsis
An authoritative reference book on EUV source technology. Topics range from an overview of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPP) and laser-produced plasmas, to a description of DPP and LPP designs and other technologies for producing EUV radiation.
Book details
Book category Books in English Technology, engineering, agriculture Industrial chemistry & manufacturing technologies Other manufacturing technologies
189.64 €
- Full title: EUV Sources for Lithography
- Author: Vivek Bakshi
- Language: English
- Binding: Hardback
- Number of pages: 900
- EAN: 9780819458452
- ISBN: 9780819458452
- ID: 06329333
- Publisher: SPIE Press
- Weight: 2088 g
- Dimensions: 262 × 180 × 57 mm
- Date of publishing: 30. November 2005
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