Code: 43909170

Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Name: Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Brand: Taylor & Francis Ltd
SKU: 43909170
Price: 239.73 EUR
Availability: InStock
Author: Oluwatobi Adeleke
ISBN: 9781032386706

by Oluwatobi Adeleke, Sina Karimzadeh, Jen, Tien-Chien (University of Johannesburg, South Africa)

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for i ... more

Language: English
Binding: Hardback
Number of pages: 496
Publisher: Taylor & Francis Ltd, 2023
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239.73 €

Full title: Machine Learning-Based Modelling in Atomic Layer Deposition Processes
Author: Oluwatobi Adeleke, Sina Karimzadeh, Jen, Tien-Chien (University of Johannesburg, South Africa)
Language: English
Binding: Hardback
Number of pages: 496
EAN: 9781032386706
ID: 43909170
Publisher: Taylor & Francis Ltd
Weight: 662 g
Dimensions: 234 × 156 mm
Date of publishing: 07. December 2023