Code: 44702474
MOS Interface Physics, Process and Characterization
by Shengkai Wang, Xiaolei Wang
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental exampl ... more
- Language:
English - Binding: Paperback
- Number of pages: 162
Publisher: Taylor & Francis Ltd, 2024
- More about this
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Book synopsis
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will be a reference for academics and postgraduates in the field of microelectronics.
Book details
68.78 €
- Full title: MOS Interface Physics, Process and Characterization
- Author: Shengkai Wang, Xiaolei Wang
- Language: English
- Binding: Paperback
- Number of pages: 162
- EAN: 9781032106281
- ID: 44702474
- Publisher: Taylor & Francis Ltd
- Weight: 453 g
- Dimensions: 229 × 152 mm
- Date of publishing: 29. January 2024
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