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Więcej informacji o GaP Heteroepitaxy on Si(100)

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Opis

Epitaxial integration of III-V semiconductors on silicon substrates has been desired over decades for high application potential in microelectronics, photovoltaics, and beyond. The performance of optoelectronic devices is still severely impaired by critical defect mechanisms driven by the crucial polar-on-non-polar heterointerface. This thesis reports almost lattice-matched growth of thin gallium phosphide films as a viable model system for III-V/Si(100) interface investigations. The impact of antiphase disorder on the heteroeptitaxial growth surface provides quantitative optical in situ access to one of the most notorious defect mechanisms, even in the vapor phase ambient common for compound semiconductor technology. Precise control over the surface structure of the Si(100) substrates prior to III-V nucleation prevents the formation of antiphase domains. The hydrogen-based process ambient enables the preparation of anomalous double-layer step structures on Si(100), highly beneficial for subsequent III-V integration.

Szczegóły książki

Kategoria Knihy po anglicky Technology, engineering, agriculture Electronics & communications engineering Electronics engineering

• Pełny tytuł: GaP Heteroepitaxy on Si(100)
• Podtytuł: Benchmarking Surface Signals when Growing GaP on Si in CVD Ambients
• Autor: Henning Döscher
• Język: Angielski
• Oprawa: Twarda
• Liczba stron: 143
• EAN: 9783319028798
• ISBN: 3319028790
• ID: 02116635
• Wydawca: Springer International Publishing AG
• Waga: 3672 g
• Wymiary: 235 × 155 × 16 mm
• Data wydania: 28. November 2013

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