Dry Etching for VLSI / Najlacnejšie knihy
Dry Etching for VLSI

Kód: 01377689

Dry Etching for VLSI

Autor Alfred J. van Roosmalen, J.A.G. Baggerman, S.J.H. Brader

This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most impo ... celý popis

154.55

Bežne: 167.43 €

Ušetríte 12.88 €


Skladom u dodávateľa
Odosielame za 10 - 13 dní
Pridať medzi želanie

Mohlo by sa vám tiež páčiť

Darčekový poukaz: Radosť zaručená
  1. Darujte poukaz v ľubovoľnej hodnote, a my sa postaráme o zvyšok.
  2. Poukaz sa vzťahuje na všetky produkty v našej ponuke.
  3. Elektronický poukaz si vytlačíte z e-mailu a môžete ho ihneď darovať.
  4. Platnosť poukazu je 12 mesiacov od dátumu vystavenia.

Objednať darčekový poukazViac informácií

Viac informácií o knihe Dry Etching for VLSI

Nákupom získate 373 bodov

Anotácia knihy

This book has been written as part of a series of scientific books being published by Plenum Press. The scope of the series is to review a chosen topic in each volume. To supplement this information, the abstracts to the most important references cited in the text are reprinted, thus allowing the reader to find in-depth material without having to refer to many additional publications. This volume is dedicated to the field of dry (plasma) etching, as applied in silicon semiconductor processing. Although a number of books have appeared dealing with this area of physics and chemistry, these all deal with parts of the field. This book is unique in that it gives a compact, yet complete, in-depth overview of fundamentals, systems, processes, tools, and applications of etching with gas plasmas for VLSI. Examples are given throughout the fundamental sections, in order to give the reader a better insight in the meaning and magnitude of the many parameters relevant to dry etching. Electrical engineering concepts are emphasized to explain the pros and cons of reactor concepts and excitation frequency ranges. In the description of practical applications, extensive use is made of cross-referencing between processes and materials, as well as theory and practice. It is thus intended to provide a total model for understanding dry etching. The book has been written such that no previous knowledge of the subject is required. It is intended as a review of all aspects of dry etching for silicon semiconductor processing.

Parametre knihy

Zaradenie knihy Knihy po anglicky Mathematics & science Physics Materials / States of matter

154.55

Obľúbené z iného súdka



Osobný odber Bratislava a 12840 dalších

Copyright ©2008-26 najlacnejsie-knihy.sk Všetky práva vyhradenéSúkromieCookies


Môj účet: Prihlásiť sa
Všetky knihy sveta na jednom mieste. Navyše za skvelé ceny.

Nákupný košík ( prázdny )

Vyzdvihnutie v Zásielkovni
zadarmo nad 59,99 €.

Nachádzate sa: