Ion Implantation Techniques / Najlacnejšie knihy
Ion Implantation Techniques

Kód: 06622566

Ion Implantation Techniques

Autor H. Glawischnig, H. Ryssel

In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thou ... celý popis

123.66


Skladom u dodávateľa v malom množstve
Odosielame za 10 - 15 dní

Potrebujete viac kusov?Ak máte záujem o viac kusov, preverte, prosím, najprv dostupnosť titulu na našej zákazníckej podpore.


Pridať medzi želanie

Mohlo by sa vám tiež páčiť

Darčekový poukaz: Radosť zaručená
  1. Darujte poukaz v ľubovoľnej hodnote, a my sa postaráme o zvyšok.
  2. Poukaz sa vzťahuje na všetky produkty v našej ponuke.
  3. Elektronický poukaz si vytlačíte z e-mailu a môžete ho ihneď darovať.
  4. Platnosť poukazu je 12 mesiacov od dátumu vystavenia.

Objednať darčekový poukazViac informácií

Viac informácií o knihe Ion Implantation Techniques

Nákupom získate 304 bodov

Anotácia knihy

In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University,' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.

Parametre knihy

Zaradenie knihy Knihy po anglicky Mathematics & science Physics Materials / States of matter

123.66

Obľúbené z iného súdka



Osobný odber Bratislava a 2642 dalších

Copyright ©2008-24 najlacnejsie-knihy.sk Všetky práva vyhradenéSúkromieCookies


Môj účet: Prihlásiť sa
Všetky knihy sveta na jednom mieste. Navyše za skvelé ceny.

Nákupný košík ( prázdny )

Vyzdvihnutie v Zásielkovni
zadarmo nad 59,99 €.

Nachádzate sa: