Kód: 36543611
MOS Interface Physics, Process and Characterization
Autor Shengkai Wang, Xiaolei Wang
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental exampl ... celý popis
- Jazyk:
Angličtina - Väzba: Pevná
- Počet strán: 162
Nakladateľ: Taylor & Francis Ltd, 2021
- Viac informácií o knihe
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Viac informácií o knihe MOS Interface Physics, Process and Characterization
Nákupom získate 308 bodov
Anotácia knihy
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will be a reference for academics and postgraduates in the field of microelectronics.
Parametre knihy
127.61 €
- Celý názov: MOS Interface Physics, Process and Characterization
- Autor: Shengkai Wang, Xiaolei Wang
- Jazyk: Angličtina
- Väzba: Pevná
- Počet strán: 162
- EAN: 9781032106274
- ISBN: 1032106271
- ID: 36543611
- Nakladateľ: Taylor & Francis Ltd
- Hmotnosť: 390 g
- Rozmery: 157 × 235 × 17 mm
- Dátum vydania: 12. October 2021
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