Optical Investigation of Transition Metal Implanted Wide Band Gap Semiconductors / Najlacnejšie knihy
Optical Investigation of Transition Metal Implanted Wide Band Gap Semiconductors

Kód: 08218045

Optical Investigation of Transition Metal Implanted Wide Band Gap Semiconductors

Autor Brian P Feller

Thin films of GaN, Al0.1Ga0.9N, and ZnO were implanted with Cr, Mn, and nickel Ni to produce dilute magnetic semiconductors. Optical and magnetic techniques were used to evaluate crystal structure restoration and coercive field st ... celý popis

69.47


Skladom u dodávateľa
Odosielame za 14 - 18 dní
Pridať medzi želanie

Mohlo by sa vám tiež páčiť

Darčekový poukaz: Radosť zaručená
  1. Darujte poukaz v ľubovoľnej hodnote, a my sa postaráme o zvyšok.
  2. Poukaz sa vzťahuje na všetky produkty v našej ponuke.
  3. Elektronický poukaz si vytlačíte z e-mailu a môžete ho ihneď darovať.
  4. Platnosť poukazu je 12 mesiacov od dátumu vystavenia.

Objednať darčekový poukazViac informácií

Viac informácií o knihe Optical Investigation of Transition Metal Implanted Wide Band Gap Semiconductors

Nákupom získate 172 bodov

Anotácia knihy

Thin films of GaN, Al0.1Ga0.9N, and ZnO were implanted with Cr, Mn, and nickel Ni to produce dilute magnetic semiconductors. Optical and magnetic techniques were used to evaluate crystal structure restoration and coercive field strength as a function of implant species and annealing temperature. Maximum crystal restoration was obtained for Al0.1Ga0.9N after annealing at 675 oC; for Cr implanted p-GaN after annealing at 750 oC; for Mn or Ni implanted p-GaN after annealing at 675 oC; for Cr implanted ZnO after annealing at 700 oC; for Mn implanted ZnO after annealing at 675 oC; and for Ni implanted ZnO after annealing at 650 oC. Maximum coercive field strengths were found for Cr implanted Al0.1Ga0.9N after annealing at 750 oC; for Mn implanted Al0.1Ga0.9N after annealing at 675 oC; for Ni implanted Al0.1Ga0.9N after annealing at 700 oC; for Cr or Mn implanted p-GaN after annealing at 725 oC; for Ni implanted p-GaN after annealing at 675 oC; for Cr or Ni implanted ZnO after annealing at 725 oC; and for Mn implanted ZnO after annealing at 725 oC. Optimum annealing conditions for optical and magnetic properties of the implanted wide band gap semiconductors agree with each other very well.

Parametre knihy

Zaradenie knihy Knihy po anglicky Society & social sciences Education

69.47

Obľúbené z iného súdka



Osobný odber Bratislava a 2642 dalších

Copyright ©2008-24 najlacnejsie-knihy.sk Všetky práva vyhradenéSúkromieCookies


Môj účet: Prihlásiť sa
Všetky knihy sveta na jednom mieste. Navyše za skvelé ceny.

Nákupný košík ( prázdny )

Vyzdvihnutie v Zásielkovni
zadarmo nad 59,99 €.

Nachádzate sa: