Kód: 43748855
This book provides a comprehensive overview of positron profilometry, specifically focusing on the analysis of defect depth distribution in materials. Positron profilometry plays a crucial role in understanding and characterizing ... celý popis
Angličtina
45.51 €
Bežne: 50.38 €
Ušetríte 4.87 €

Nákupom získate 110 bodov
Anotácia knihy
This book provides a comprehensive overview of positron profilometry, specifically focusing on the analysis of defect depth distribution in materials. Positron profilometry plays a crucial role in understanding and characterizing defects in a wide range of materials, including metals, semiconductors, polymers, and ceramics. By analyzing the depth distribution of defects, researchers can gain insights into various material properties, such as crystal structure, defect density, and diffusion behavior. The author's extensive research spanning a period of two decades has primarily centered on subsurface zones. These regions, located beneath the surface and subjected to various surface processes, play a crucial role in generating defect distributions. Three experimental techniques and their data analysis are described in detail: a variable-energy positron beam (VEP) called sometimes a slow positron beam, a technique called implantation profile depth scanning (DSIP), and a sequential etching (SET) technique. The usability of these techniques is illustrated by many examples of measurements by the author and others.
Parametre knihy
Zaradenie knihy Knihy po anglicky Technology, engineering, agriculture Mechanical engineering & materials Materials science
45.51 €
Angličtina
Osobný odber Bratislava a 12790 dalších
Copyright ©2008-26 najlacnejsie-knihy.sk Všetky práva vyhradenéSúkromieCookies
24 miliónov titulov
Vrátenie do mesiaca
02/210 210 99 (8-15.30h)Nákupný košík ( prázdny )