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Viac informácií o knihe Atomic Layer Deposition

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• Anotácia kniha
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Anotácia knihy

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Parametre knihy

Zaradenie knihy Knihy po anglicky Technology, engineering, agriculture Electronics & communications engineering Electronics engineering

• Celý názov: Atomic Layer Deposition
• Podnázov: Principles, Characteristics, and Nanotechnology Applications
• Autor: Tommi Kaariainen, David Cameron, Marja-Leena Kaariainen, Arthur Sherman
• Jazyk: Angličtina
• Väzba: Pevná
• Počet strán: 272
• EAN: 9781118062777
• ISBN: 1118062779
• ID: 04949772
• Nakladateľ: John Wiley & Sons Inc
• Hmotnosť: 582 g
• Rozmery: 164 × 240 × 25 mm
• Dátum vydania: 28. June 2013

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