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Viac informácií o knihe CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155

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Anotácia knihy

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

Parametre knihy

Zaradenie knihy Knihy po anglicky Technology, engineering, agriculture Mechanical engineering & materials Production engineering

• Celý názov: CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
• Autor: Alexander A. Demkov, Bill Taylor, H. Rusty Harris, Jeffery W. Butterbaugh
• Jazyk: Angličtina
• Väzba: Brožovaná
• Počet strán: 194
• EAN: 9781107408326
• ISBN: 1107408326
• ID: 02439020
• Nakladateľ: Cambridge University Press
• Hmotnosť: 27 g
• Rozmery: 229 × 152 × 10 mm
• Dátum vydania: 05. June 2014

Obľúbené z iného súdka

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