Kód: 43909170
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for i ... celý popis
Angličtina
Nákupom získate 580 bodov
Anotácia knihy
This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.
Parametre knihy
239.28 €
Angličtina
Osobný odber Bratislava a 12820 dalších
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