Kód: 44702474
MOS Interface Physics, Process and Characterization
Autor Shengkai Wang, Xiaolei Wang
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental exampl ... celý popis
- Jazyk:
Angličtina - Väzba: Brožovaná
- Počet strán: 162
Nakladateľ: Taylor & Francis Ltd, 2024
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Anotácia knihy
The electronic device based on Metal Oxide Semiconductor (MOS) structure is the most important component of a large-scale integrated circuit and the key to achieving high performance devices. This book contains experimental examples focusing on MOS and will be a reference for academics and postgraduates in the field of microelectronics.
Parametre knihy
68.91 €
- Celý názov: MOS Interface Physics, Process and Characterization
- Autor: Shengkai Wang, Xiaolei Wang
- Jazyk: Angličtina
- Väzba: Brožovaná
- Počet strán: 162
- EAN: 9781032106281
- ID: 44702474
- Nakladateľ: Taylor & Francis Ltd
- Hmotnosť: 453 g
- Rozmery: 229 × 152 mm
- Dátum vydania: 29. January 2024
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