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Viac informácií o knihe Predictive Simulation of Semiconductor Processing

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Anotácia knihy

Predictive Simulation of Semiconductor Processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.Predictive simulation of semiconductor processing enables researchers and developers to extend the scaling range of semiconductor devices beyond the parameter range of empirical research. It requires a thorough understanding of the basic mechanisms employed in device fabrication, such as diffusion, ion implantation, epitaxy, defect formation and annealing, and contamination. This book presents an in-depth discussion of our current understanding of key processes and identifies areas that require further work in order to achieve the goal of a comprehensive, predictive process simulation tool.

Parametre knihy

Zaradenie knihy Knihy po anglicky Technology, engineering, agriculture Mechanical engineering & materials Materials science

• Celý názov: Predictive Simulation of Semiconductor Processing
• Podnázov: Status and Challenges
• Autor: Jarek Dabrowski, Eicke R. Weber
• Jazyk: Angličtina
• Väzba: Brožovaná
• Počet strán: 490
• EAN: 9783642058042
• ISBN: 3642058043
• ID: 01651135
• Nakladateľ: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
• Hmotnosť: 859 g
• Rozmery: 235 × 155 × 28 mm
• Dátum vydania: 03. December 2010

Obľúbené z iného súdka

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