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Viac informácií o knihe Ion Implantation Technology

• Parametre knihy
• Anotácia kniha
• Obľúbené z iného súdka

Nákupom získate 626 bodov

Anotácia knihy

The conference is focused on recent advances and emerging technologies in semiconductor processing before, during and after ion implantation. The content encompasses fundamental physical understanding, common and novel applications as well as equipment issues, maintenance and design. The primary audience is process engineers in the microelectronics industry. Additional contributions come from academia and other industry segments (automotive, aerospace, and medical device manufacturing).

Parametre knihy

Zaradenie knihy Knihy po anglicky Technology, engineering, agriculture Electronics & communications engineering Electronics engineering

• Celý názov: Ion Implantation Technology
• Podnázov: 17th International Conference on Ion Implantation Technology
• Autor: Edmund G. Seebauer, Susan B. Felch, Amitabh Jain, Yevgeniy V. Kondratenko
• Jazyk: Angličtina
• Väzba: Pevná
• Počet strán: 576
• EAN: 9780735405974
• ISBN: 0735405972
• ID: 01391164
• Nakladateľ: Springer, Berlin
• Hmotnosť: 1538 g
• Rozmery: 279 × 216 × 36 mm
• Dátum vydania: 21. January 2011

Obľúbené z iného súdka

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